PRODUCT

제품소개
합성쿼츠 잉곳

가공하지 않은 합성쿼츠 덩어리

합성쿼츠 Focus Ring

반도체 Etching 공정에 들어가는
합성쿼츠 재질의 Focus Ring

ArF Class Blankmask Substrate


반도체 노광 공정에서 ArF(193nm) 광원을 사용하는 포토마스크의 기판 소재로, 미세 회로 패턴 형성에 사용

Technical Information


Product

  • Product Name : STQ-V1, STQ-C1
  • Manufacturing Process : VAD / OVD
  • Forms Available : Ingot, Disk, Ring, Substrate, wafer

Applications

  • Semiconductor (Photomask, Etching rings, Wafer support)
  • MEMS Substrate
  • TGV/Packaging - TGV Glass Substrate, Interposer, Spacer
  • Optical elements (UV/VUV windows, lenses, substrates)
  • LCD / LSI photolithography
  • Plasma-resistant components

Optical Properties

Item
STI

Total Transmission 

> 90% (200–1500nm)

OH Content 

<1 ppm

Fluorescence 

None detected (254nm)

Birefringence

< 1.971nm/cm

Bubbles/Inclusions

0


Thermal Properties

Item
Value

Strain Point

1060° C

Annealing Point 

1120° C

Softening Point 

1600° C

Thermal Expansion

(30–150°C) 

0.56 ppm/K

Density 

2.2


Mechanical Properties

Property 

Value

Elastic Modulus (GPa)

72

Poisson’s Ratio 

0.154

Density (g/cm³) 

2.2

Knoop Hardness (200g) 

≥ 650

Bending Strength

50MPa


Ultra Low OH Content

• < 1 ppm moisture level – ideal for ArF/KrF lithography &
high-temperature plasma processes

High Optical Transmittance

• Over 90% transmittance across UV to IR range


6N High Purity Synthetic Quartz

• Excellent chemical stability with minimal metallic contamination



Proprietary reflow technology

• Removes Internal bubble, uniformity

• Enhances optical clarity

• Relieves residual stress improves durability

In-House Manufacturing System

• All processes integrated in-house for stable quality-control


Excellent Plasma Durability

• Proven long lifecycle in semiconductor tools (e.g., Focus Ring, Edge Ring)

Purity Analysis Values

Component

Metal Impurity (ppm)

Component

Metal Impurity (ppm)

Aluminum (Al)

0.0557 ( < 0.1 )

Lead (Pb)

0.0001 ( < 0.1 )

Antimony (Sb)

0.0001 ( < 0.1 )

Lithium (Li)

0.0000 ( < 0.1 )

Arsenic (As)

0.0001 ( < 0.1 )

Magnesium (Mg)

0.0060 ( < 0.1 )

Barium (Ba)

0.0004 ( < 0.1 )

Manganese (Mn)

0.0002 ( < 0.1 )

Beryllium (Be)

0.0001 ( < 0.1 )

Molybdenum (Mo)

0.0001 ( < 0.1 )

Bismuth (Bi)

0.0002 ( < 0.1 )

Nickel (Ni)

0.0009 ( < 0.1 )

Boron (B )

0.0016 ( < 0.1 )

Potassium (K )

0.0379 ( < 0.1 )

Cadmium (Cd)

0.0001 ( < 0.1 )

Sodium (Na)

0.0367 ( < 0.1 )

Calcium (Ca)

0.0509 ( < 0.1 )

Strontium (Sr)

0.0002 ( < 0.1 )

Chromium (Cr)

0.0005 ( < 0.1 )

Tin (Sn)

0.0005 ( < 0.1 )

Cobalt (Co)

0.0004 ( < 0.1 )

Titanium (Ti)

0.0004 ( < 0.1 )

Copper (Cu)

0.0191( < 0.1 )

Tungsten (W )

0.0002 ( < 0.1 )

Gallium (Ga)

0.0001 ( < 0.1 )

Vanadium (V )

0.0001 ( < 0.1 )

Germanium (Ge)

0.0001 ( < 0.1 )

Zinc (Zn)

0.0409 ( < 0.1 )

Iron (Fe)

0.0071 ( < 0.1 )

Zirconium (Zr)

0.0001 ( < 0.1 )

Total metal purity

 < 1 ppm


Optic Properties

Model (Sasung Electronics test sample)

Inside & Outside Bubble Analysis values (ea)

STI Synthetic Quartz Focus ring

Zero (0)


Transmittance and

OH Content Data

STI Synthetic Quartz

Metallic Impurities

[ppb]

OH Content

[ppm]

Total Transmittance

( %)

STI-V Grade

< 1000

 < 1

> 89% (200 nm ~ 2200 nm)

STI-C Grade

< 1000

 300 ~ 500

> 89% (200 nm ~ 2600 nm)

Corning 7980 Grade

< 1000

800 ~ 1000

> 89% (200 nm ~ 1350 nm)

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